Supply, Delivery, Installation & Commissioning of a Semiconductor contact mask aligner for 4” wafers

Tender description

The University of Strathclyde is looking to purchase Supply, Delivery, Installation and Commissioning of a Semiconductor contact mask aligner for 4” wafers The equipment will be installed in the cleanroom suite of the University’s Technology and Innovation Centre. It is essential to maintain delivery of photonic and electro-photonic microsystems in a number of major projects, involving funders including RCUK, EU and RA Eng, and aligning with strategic themes including quantum technologies, optical communications and neurophotonics. The rapid patterning of large wafer areas possible using the mask aligner is appropriate for repeated microfabrication when device designs become optimized, and offers high throughput. This capability complements the more flexible but slower patterning method of laser lithography also available in the cleanroom, that is more appropriate for prototyping. Lot 1: Lot 1 New Equipment The University of Strathclyde is looking to purchase Supply, Delivery, Installation and Commissioning of a Semiconductor contact mask aligner for 4” wafers The equipment will be installed in the cleanroom suite of the University’s Technology and Innovation Centre. It is essential to maintain delivery of photonic and electro-photonic microsystems in a number of major projects, involving funders including RCUK, EU and RA Eng, and aligning with strategic themes including quantum technologies, optical communications and neurophotonics. The rapid patterning of large wafer areas possible using the mask aligner is appropriate for repeated microfabrication when device designs become optimized, and offers high throughput. This capability complements the more flexible but slower patterning method of laser lithography also available in the cleanroom, that is more appropriate for prototyping. The equipment is a mask aligner for exposure in one shot through a patterned photomask with controlled UV light of a flat sample preliminary coated with photoresist. Prior to exposure the sample and the photomask can be aligned with each other by mean of a microscope, on at least two locations, and preferably observed simultaneously.