Wet-thermal oxidation furnace

Tender description

A complete wet oxidation system is required for the oxidation of III-V compound semiconductors, primarily for vertical cavity surface emitting laser (VCSEL) and ridge waveguide applications Lot 1: A complete wet oxidation system is required for the oxidation of III-V compound semiconductors, primarily for vertical cavity surface emitting laser (VCSEL) and ridge waveguide applications. We currently own an ALOXTEC system that was purchased in 2017. It was purchased as a 4” capable system but was upgraded to a 150mm capability following a period of joint development between ALOXTEC (formerly AET) and the ICS. We need to upgrade this system to handle 200mm wafers to continue with our research output and collaboration with our industry partners.