Photolithography Cluster

Tender description

The Institute for Compound Semiconductors (ICS) is in the process of constructing a new state of the art cleanroom facility that will be situated within the Cardiff University Translational Research Hub. This facility requires the capacity for 200 mm semiconductor wafer processing with a medium-scale pilot line throughput. One such capability is a comprehensive suite of lithography wet processing tools that includes, resist spinning, vapour priming, substrate baking, and puddle/spray development of exposed substrates using both TMAH and solvent based media. This tender is separated into 3 lots that will be referred to as: - Lot 1: Spin, bake & prime - Lot 2: Developer (TMAH) - Lot 3: Developer (Solvent) Lot 1: Spin, bake & prime Spin, bake and prime tool Lot 2: Developer (TMAH) The proposed tool must be a spray/puddle development system that is compatible with conventional TMAH based resist developers (such as AZ726 and MF319 etc). Lot 3: Developer (Solvent) The proposed tool must be a spray/puddle development system that is compatible with conventional TMAH based resist developers (such as AZ726 and MF319 etc).