1691 - Nanobeam nb5 service contract

Tender description

Service Maintenance Contract for Nanobeam nb5 Electron Beam Lithography (EBL) instrument. The electron beam lithography (EBL) instrument requires both high performance and high reliability: o Patterning novel resists including self-assembled monolayers (SAMs) on glass or semiconductor substrates by direct writing onto the SAM with an electron beam. o Writing photonic crystals and optical waveguides on III-V semiconductor heterostructures such as GaAs/AlGaAs. o Writing leads onto 2D materials such as graphene and InSe. o Nano-electronic devices in GaAs/AlGaAs heterostructures. o Spintronic devices consisting of thin metal layers deposited by sputtering onto semiconductor devices. o Nanomechanical devices made from silicon nitride on silicon. These applications are scientifically challenging, and as such a comprehensive and robust service maintenance contract is required to ensure maximum instrument uptime.