Large Scale Photolithography Spray Coater

Tender description

A stand-alone, fully-enclosed spray coating system for coating ring mounted flexible polypropylene substrates with photoresist over a diameter of 900mm. The thickness of the photoresist should be uniform to within 100nm over the full substrate area but should also be variable between 500nm and 1800nm. Physical proof of capability will be required for either Shipley S1813 photoresist or AZ P4110. The flexible substrate would typically be 25um polypropylene and be supported on an aluminium ring. The system should also be able to coat standard silicon wafer substrates or quartz to the same uniformity. Lot 1: A stand-alone, fully-enclosed spray coating system for coating ring mounted flexible polypropylene substrates with photoresist over a diameter of 900mm. The thickness of the photoresist should be uniform to within 100nm over the full substrate area but should also be variable between 500nm and 1800nm. Physical proof of capability will be required for either Shipley S1813 photoresist or AZ P4110. The flexible substrate would typically be 25um polypropylene and be supported on an aluminium ring. The system should also be able to coat standard silicon wafer substrates or quartz to the same uniformity.