Awarded contract

PECVD Plasma Deposition Tool

Details

Topic
Laboratory, optical and precision equipments (excl. glasses)
Published
29 March 2022

Tender description

A new PECVD plasma deposition tool for use within the ICS cleanroom to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers. The requirement of the tool is to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers. Lot 1: The requirement of the tool is to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers.

Timeline

  1. Completed: Award published29 March 2022
    Current notice
  2. Completed: Award date29 March 2022

About the buyer

Cardiff University is a public sector buyer in United Kingdom publishing tenders and awards on Stotles. Explore their procurement activity and find more opportunities like this one.

Relevant CPV codes

  • 38000000 · Laboratory, optical and precision equipments (excl. glasses)

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