Ultra-High Resolution Scanning thermal probe nanolithography with hybrid micro-nanolithography & 3D lithography capabilities.

Tender description

Ultra-High Resolution Scanning thermal probe nanolithography with hybrid micro-nanolithography & 3D lithography capabilities. The AFM/thermal lithography system will enable patterning physical and chemical features with the nanoscale resolution, which is decisive for molecular devices and 2D-material devices. In addition, the integration of AFM, laser writing and thermal imaging has the potential for the development of new experimental techniques on correlation aspects of scanning based nanoscopy. The proposed platform must include AFM-based thermal lithography system equipped with grey scale patterning. Critically, the proposed platform must be fully compatible with argon/nitrogen-filled glovebox to enable operation in an inert environment. Lot 1: Ultra-High Resolution Scanning thermal probe nanolithography with hybrid micro-nanolithography & 3D lithography capabilities. With the increasing demands on devices comprising nanoscale features with high resolution (e.g., in high performance computing, high density data storage, devices operating in THz range, sub-wavelength waveguides, photonic crystals and plasmonic structures, to name a few) and reducing power consumption by scaling electronic devices to sub-10 nm, new materials and new lithographic techniques are pivotal.