Supply of Oxidation Furnace & High-temperature Annealing Systems

Tender description

This Tender Specification is for the supply and installation of an Oxidation Furnace and two High-temperature Annealing Systems. These systems will be of strategic importance in expanding the capabilities that the CISM will be able to provide, and reliability of the equipment is paramount to maintaining and supporting the wide array of experimental work that will be conducted within the facility. For the purposes of this tender, each tool will be considered as a separate Lot. Tenderers are invited to tender for one or more of the Lots as follows: Lot 1 – Oxidation Furnace for SiC/Si – to be delivered to Newport Wafer Fab. Lot 2 – SiC Post-implant Annealing System – to be delivered to Newport Wafer Fab. Lot 3 – Rapid Thermal Annealing System – to be delivered to Swansea University Singleton Campus. Lot 1: Oxidation Furnace for SiC/Si Oxidation Furnace for SiC/Si. Funding for this procurement has been secured from the Driving the Electric Revolution (DER) Industrialisation Centres Programme via Innovate UK. Lot 2: SiC Post-implant Annealing System SiC Post-implant Annealing System. Funding for this procurement has been secured from the Driving the Electric Revolution (DER) Industrialisation Centres Programme via Innovate UK. Lot 3: Rapid Thermal Annealing System Rapid Thermal Annealing System. Funding for this procurement has been secured from the Driving the Electric Revolution (DER) Industrialisation Centres Programme via Innovate UK.