Contract for a Nanoimprint Upgrade

Tender description

The CSIM Semiconductor process development is a key area of growth at Swansea University, and is aligned with the Welsh Government’s ‘Innovation Wales’ strategy which identifies semiconductor materials and device technology as one of the foundations in the future expansion of the Welsh economy. The University’s new flagship Centre for Integrative Semiconductor Materials (CISM) aims to further stimulate growth in this area by delivering a bespoke, integrated facility for semiconductor research and technology development. The GBP 90M project includes GBP 60M co-investment from industry, together with a GBP 30M grant from Research England and will allow construction of state-of-the-art cleanroom and laboratory space, that will accommodate new fabrication and characterisation equipment. This procurement was for the upgrade of a SUSS Substrate Conformal Imprint Lithography (SCIL) tool to enable nano imprinting of 200mm wafers (currently the tool is capable of processing wafer up to 150mm wafers).