GB-Newcastle: T20/0047

Tender description

Northumbria university requires an atomic layer deposition (ALD) system for the conformal deposition of ultra-thin films with low pinhole densities for nanometer scale structures and devices. The system should be upgradeable and expandable in nature (e.g. plasma enhanced, additional lines) to allow for multi-disciplinary R&D activities and future range of materials. The ALD system should allow for repeatable and controllable ultra-thin films from recipes and also allow the user to develop their own process/recipes. The ALD system should be ready to commission onsite by simply connecting to the Lab services, therefore, all associated components are to be included, such as (not limited to) vacuum pumps, abatement for safe disposal of exhaust gases, system control and monitoring.