Closed tender

Miscellaneous special-purpose machinery

Details

Buyer
Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e. V. über Vergabeportal deutsche eVergabe
Topic
Miscellaneous special-purpose machinery
Published
10 July 2020
Submission
12 August 2020

Tender description

To realize a fast turnaround from lithographic pattern design to pattern on a substrate, EMFT is looking for an equipment for direct exposure of photo resists per-formed with sequentially writing. Distinct from a glass mask exposure, the equipment must be able to align the layer under exposure relative to an underlying layer, which is carrying alignment marks. The wavelength selection of the equipment must fit to the standard resist available on the market. To this purpose, the equipment needs the capability to handle different sample sizes and shapes. This can be done as single substrate application by an operator or by a substrate handling robot as part of the equipment. .

Timeline

  1. Completed: Tender published10 July 2020
    Current notice
  2. Completed: Submission date12 August 2020

About the buyer

Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e. V. über Vergabeportal deutsche eVergabe is a public sector buyer in Germany publishing tenders and awards on Stotles. Explore their procurement activity and find more opportunities like this one.

Relevant CPV codes

  • 42990000 · Miscellaneous special-purpose machinery

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