Laboratory, optical and precision equipments (excl. glasses)

Tender description

The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility. We would want to be able to deposit ceramic and metallic systems including alloys. This is for a range of research applications such as corrosion and wear protection. The system should incorporate the following features, which may be provided in one or more systems: multi-target sputter PVD system incorporating at least two sputter targets and bias capability to the targets and substrate. A twin electron beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge. The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility. We would want to be able to deposit ceramic and metallic systems including alloys. This is for a range of research applications such as corrosion and wear protection. The system should incorporate the following features, which may be provided in one or more systems: multi-target sputter PVD system incorporating at least two sputter targets and bias capability to the targets and substrate. A twin electron beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge. The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility. We would want to be able to deposit ceramic and metallic systems including alloys. This is for a range of research applications such as corrosion and wear protection. The system should incorporate the following features, which may be provided in one or more systems: multi-target sputter PVD system incorporating at least two sputter targets and bias capability to the targets and substrate. A twin electron beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge.