Microscopes

Tender description

Confocal Microscope/Widefield, Fluorescence microscope/Field Emission Scanning Electron Microscope/4. EM specimen preparation equipment The University of East Anglia (UEA) has a requirement to procure 3 microscope systems together with accessories: Lot 1: A confocal Microscope, either Point-scanner or Spinning-disc; Lot 2: an Inverted, Widefield, Fluorescence Microscope; Lot 3: A Field Emission Scanning Electron Microscope (FE-SEM); and Lot 4: Equipment for EM Specimen Preparation. Both the optical microscopes must be optimized for live-cell imaging; i.e., equipped with temperature and CO2 regulation, and with an IR-based autofocus controller to prevent focal drift. The confocal microscope must have the facility to image with resolution better than the Abbe/diffraction limit without need of deconvolution. Such improvement in resolution beyond the diffraction limit should be available in all imaging modes, and with as many objectives as possible. 1) A confocal microscope based on a fully-motorised, inverted stand with high NA objectives: 5x, 10x and 20x air, 40x and 60x water- or silicone-immersion, and 40x and 60x oil-immersion lenses. Fast focus control (e.g., piezo-controlled) for rapid Z-stack acquisition, precise stage control for image tiling, and a means of autofocus control in timelapse experiments that doesn’t require sample illumination. Halogen and LED light-sources, filter sets for blue, green and orange/red fluorophores, and optics for brightfield, phase-contrast and DIC to aid sample localization. 6 laser-lines for blue, cyan, green, yellow, red and far-red fluorophore excitation and the appropriate filters/diffraction gratings for the most sensitive detection. At least 2 detectors/cameras for simultaneous 2-channel acquisition. For point-scanners at least 2 detectors should be GaAsP, or similar. For spinning-disc systems, the cameras should be sCMOS or EM-CCD. Facility to capture transmitted-light images (brightfield, phase-contrast and DIC) in combination with confocal images. The system should have the facility to collect images with a resolution of 120 x 120 x 350 nm. The system should be optimized to use the lowest achievable laser powers to avoid sample photodamage and fluorophore photobleaching. The microscope should also be able to collect a 512 x 512 pixel, confocal image in less than 25 msec, and a super-resolution image in less than 250 msec (for point-scanning systems this must be achieved without the use of a resonant scanner). Workstation with software for multi-channel, multi-position, timelapse, Z-stack acquisition, spectral scanning, and adequate RAM and disc-space to allow the fastest acquisition. Vibration-isolation table. Additional licence for a full version of the software. 3 to 5 day on-site, after-sales training. 4-year, fully-comprehensive service contract. 2) A widefield, fluorescence microscope based on a fully-motorized inverted stand with low-magnification objectives of long-working distance, and high magnification objectives giving high resolution: 2,5x (WD ~10 mm), 5x (WD ~10 mm), 10x (WD ~5 mm) and 20x (WD ~ 3 mm) air, 40x/1.1NA (WD ~ 600 μm) water-immersion, 40x/1.4NA, 60x/1.4NA and 100x/1.4NA oil-immersion lenses. Fast focus control (e.g., piezo-controlled) for rapid Z-stack acquisition, precise stage control for image tiling, and a means of autofocus control in timelapse experiments that doesn’t require sample illumination. Halogen/LED light source for transmitted light imaging (brightfield, phase-contrast and DIC). An LED light-source with multiple, individual LEDs for different fluorophores and matched filter sets for blue, green, red, far-red acquisition, and a dual-band filter set for eGFP/mCherry 2-channel acquisition. Camera must be a front-illuminated, sCMOS and the microscope stand should have the option for increased magnification (1,5-2.5x) to the camera port. Workstation with software for multi-channel, multi-position, timelapse, Z-stack acquisition, and adequate RAM and disc-space to allow the fastest acquisition. Vibration-isolation table. Microscope should have potential upgradeability to TIRF in the future. The microscope may be an ex-demonstration model, assuming that it is no more than 2-years old, is in excellent condition and comes with a full service contract. Additional licence for a full version of the software. 3 to 5 day on-site, after-sales training. 4-year, fully-comprehensive service contract. 3) A field emission scanning electron microscope designed for high resolution and greatest flexibility in analysis is required. The SEM must provide the capability to select back-scattered electrons according to energy within its in-column detection system. Parallel in-column detection of secondary electrons and backscattered electrons is required. The SEM has to provide highest flexibility to enable both high resolution work and flexibility to image a wide range of different sample materials including insulating materials, which requires variable pressure imaging, and magnetic or magnetisable materials. The microscope must also possess scanning TEM and EDS/X (with a minimum 100 mm2 detector area) capability. The SEM must be provided with a high sensitivity analytical/compositional analysis system and comprehensive work station. The SEM must be equipped with a highly automated, column-mounted, gas-cooled cryo-sem preparation and cryo-transfer system suitable for high resolution FESEM imaging. A full and comprehensive warranty and service package is also required to cover a 4-year period. Provision of comprehensive training and technical support is also required. We require equipment to support specimen preparation for EM. This will include an automated/semi-automated critical point dryer; chamber and specimen holder capabilities (e.g. TEM grid, bulk samples, porous samples, etc.) and process control. We will also require a sputter coater and carbon evaporator/coater for high resolution EM applications with system configuration and process control (e.g. vacuum system, carbon evaporation, metal sputtering, glow discharge, etc.), versatile stage capability (e.g. tilt, slide, planetary, wafer, stubs, multiple samples, etc.) and film thickness monitoring. A requested list of items is provided in Annexe 3.