Closed tender

Reactive Ion Etching System For SiO2 and Si3N4 Etching

Details

Published
3 February 2017
Submission
23 February 2017

Tender description

A benchtop reactive ion etching system to be used at the University of Bristol for simple fabrication projects. The system should be easy to use with an intuitive design. The system will be capable of etching the following materials: SiO2, (silicon-dioxide) and Si3N4 (silicon-nitride) and polyimide. The system will sit in a class 10,000 cleanroom. The processes carried out by the system should be compatible with standard CMOS processing techniques.

Timeline

  1. Completed: Tender published3 February 2017
    Current notice
  2. Completed: Submission date23 February 2017

About the buyer

University of Bristol is a public sector buyer in United Kingdom publishing tenders and awards on Stotles. Explore their procurement activity and find more opportunities like this one.

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