Reactive Ion Etching System For SiO2 and Si3N4 Etching
Details
- Published
- 3 February 2017
- Submission
- 23 February 2017
- Source
- uk:bravosolution
Tender description
A benchtop reactive ion etching system to be used at the University of Bristol for simple fabrication projects. The system should be easy to use with an intuitive design. The system will be capable of etching the following materials: SiO2, (silicon-dioxide) and Si3N4 (silicon-nitride) and polyimide. The system will sit in a class 10,000 cleanroom. The processes carried out by the system should be compatible with standard CMOS processing techniques.
Timeline
- Completed: Tender published3 February 2017Current notice
- Completed: Submission date23 February 2017
About the buyer
University of Bristol is a public sector buyer in United Kingdom publishing tenders and awards on Stotles. Explore their procurement activity and find more opportunities like this one.
Decision makers
Connect with the people behind this procurement.
| Contact name | Job title | Phone number | Work email |
|---|---|---|---|
| Head of Procurement | +44 •••• •••••• | ••••••••@university-of-bristol.gov | |
| Commercial Director | +44 •••• •••••• | ••••••••@university-of-bristol.gov | |
| Procurement Manager | +44 •••• •••••• | ••••••••@university-of-bristol.gov | |
| Category Lead | +44 •••• •••••• | ••••••••@university-of-bristol.gov | |
| Senior Buyer | +44 •••• •••••• | ••••••••@university-of-bristol.gov | |
| Contracts Manager | +44 •••• •••••• | ••••••••@university-of-bristol.gov |
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