Closed tender

Lasers

Details

Topic
Lasers
Published
14 June 2017
Submission
14 July 2017

Tender description

The required equipment is a mask aligner (alignment of a substrate or wafer to a patterned mask for UV photolithography) able to use variable sized masks and substrates and with top and bottom side alignment capability. It should have the option, priced separately, of DUV exposure for PMMA resist. The required equipment is a mask aligner (alignment of a substrate or wafer to a patterned mask for UV photolithography) able to use variable sized masks and substrates and with top and bottom side alignment capability. It should have the option, priced separately, of DUV exposure for PMMA resist.

Timeline

  1. Completed: Tender published14 June 2017
    Current notice
  2. Completed: Submission date14 July 2017

About the buyer

Cardiff University is a public sector buyer in United Kingdom publishing tenders and awards on Stotles. Explore their procurement activity and find more opportunities like this one.

Relevant CPV codes

  • 38636100 · Lasers

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