E/2797 - Ellipsometer

Tender description

The University of Leeds is seeking tenders for an ex situ (standalone) spectroscopic ellipsometer. The system will be used for research and should offer flexibility of use, having the ability to measure the properties of thin-films (including isotropic and anisotropic single films and multiple layer stacks) deposited on Si, GaAs and quartz substrates amongst others. The system must be capable of measuring the thickness (and other optical properties) of: o ALD-deposited oxides and nitrides of: Sn, Hf, Al, Ti amongst others (typical film thickness < 50 nm). In particular, measurement of 1.8 ? Al2O3 films grown on Si (plus its native oxide) is required. o PECVD-deposited silicon oxide, nitride and oxinitride films (typical film thickness < 2 ?m). o Electron-beam resists including PMMA, HSQ and ?-chloromethacrylate:?-methylstyrene copolymers (ZEP-520A) etc. films (typical film thickness < 1 ?m). o Photoresists including novolac-based (e.g. S1813, AZ4562 etc.) and epoxy-based (e.g. SU-8) films (typical film thickness < 10 ?m). In addition, measurement of the thickness (and other optical properties) of the following would be desirable: o Self-assembled monolayers formed on Au surfaces (typical film thickness < 1nm). o Thin (10's nm) metal films. o Photoresists (as defined above) in the thickness range 10 - 150 ?m. These properties may include, but are not limited to: optical properties, surface roughness, interface properties, material gradients, porous films, depolarization. Vendors may submit multiple tenders if suitable alternative equipment exists within their product range, or may detail alternative options within a single tender response.