Awarded contract

Dry-etching equipment

Details

Value
GBP 370,000
Topic
Dry-etching equipment
Published
2 December 2016

Tender description

The Inductively Coupled Plasma Reactive Ion Etch machine is a specialist semiconductor clean-room processing tool for dry etching of samples of semiconductor, polymer or metal in a high-vacuum chamber using gas. High purity reactive gas plasmas, are generated in the vacuum chamber which react with the material on the surface of the sample to etch it away. The Inductively Coupled Plasma Reactive Ion Etch machine is a specialist semiconductor clean-room processing tool for dry etching of samples of semiconductor, polymer or metal in a high-vacuum chamber using gas. High purity reactive gas plasmas, are generated in the vacuum chamber which react with the material on the surface of the sample to etch it away.

Timeline

  1. Completed: Award published2 December 2016
    Current notice
  2. Completed: Award date2 December 2016

About the buyer

Cardiff University is a public sector buyer in United Kingdom publishing tenders and awards on Stotles. Explore their procurement activity and find more opportunities like this one.

Relevant CPV codes

  • 22520000 · Dry-etching equipment

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Decision makers

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