Laboratory, optical and precision equipments (excl. glasses)

Tender description

1 Background 1.1. The University of Cambridge, Department of Physics provides modern laboratory accommodation and state of art research facilities. The research of the Department aims to understand the fundamental behaviour of physical systems and requires state-of the-art equipment for that purpose. 2. Scope of Requirements 2.1. The University requires a dual chamber ultra-high vacuum thin-film deposition system with multiple magnetron sputtering sources, e-beam source, load-lock, and all associated vacuum pumps, system control and monitoring. The system will be used mostly for the deposition of low temperature refractory superconductors including reactive deposition. The system will handle conventional wafers with diameters of up to 100 mm and have substrate temperature control from liquid nitrogen temperatures to 900 C. The system will include Ar ion beam for substrate cleaning and the capability for separate rf substrate bias. The requirements are more fully described in Section 3 of this tender. 3. Equipment Demonstrations 3.1. It is the University's intention to complete the tender evaluation in such time that the contract for this equipment could be awarded within 6 weeks of the tender closing date. Please note that companies invited to tender may be required to provide access to demonstrations of similar systems at appropriate premises.