Laboratory, optical and precision equipments (excl. glasses)

Tender description

CRANN, TCD is seeking to procure a state-of-the-art sputter deposition tool — ‘Trifolium Dubium’ for the development of materials and thin film devices. Magnetic tunnel junctions and Heusler alloys are expected to be a major component of the research conducted using this system, as well as blanket films and stacks of novel multiferroics, magnetic and/or transparent oxides. The system will be the core of a national access facility and will be available for use by a large number of research groups in both academia and industry, and as such performance and flexibility are paramount. The requirement will be divided into three (3) Lots. It would be envisaged that the three (3) lots will be broken down as follows: Lot 1: Sputter Chamber #1; Lot 2: XPS Chamber; Lot 3: Water Transfer System Arrangement and Vacuum. The base tool would be split into 2 chambers connected via a vacuum transfer system. The tool would be a fully integrated system, with all chambers interconnected under vacuum with wafer transfer between chambers for subsequent processing steps. The tool should be capable of co-deposition of various materials with low roughness and good uniformity across 4” (100 mm) diameter substrates, including at high temperatures. 1 chamber would be used primarily for deposition of metals, while the other would be designed for deposition of oxides and nitrides, including reactive processes involving the introduction of oxygen and/or nitrogen into the chamber. Additional deposition chambers such as for pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) are considered, as well. These are to be fully integrated into the vacuum transfer system above. As such, a suitable Nd: YAG laser is potentially required for PLD. Finally, in an attempt to improve the in situ characterisation capabilities, a dedicated, wafer compatible X-ray photo-electron spectroscopy (XPS) analytics chamber is also considered. The base tool would be split into 2 chambers connected via a vacuum transfer system. The tool would be a fully integrated system, with all chambers interconnected under vacuum with wafer transfer between chambers for subsequent processing steps. The tool should be capable of co-deposition of various materials with low roughness and good uniformity across 4” (100 mm) diameter substrates, including at high temperatures. 1 chamber would be used primarily for deposition of metals, while the other would be designed for deposition of oxides and nitrides, including reactive processes involving the introduction of oxygen and/or nitrogen into the chamber. Additional deposition chambers such as for pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) are considered, as well. These are to be fully integrated into the vacuum transfer system above. As such, a suitable Nd: YAG laser is potentially required for PLD. Finally, in an attempt to improve the in situ characterisation capabilities, a dedicated, wafer compatible X-ray photo-electron spectroscopy (XPS) analytics chamber is also considered. The base tool would be split into 2 chambers connected via a vacuum transfer system. The tool would be a fully integrated system, with all chambers interconnected under vacuum with wafer transfer between chambers for subsequent processing steps. The tool should be capable of co-deposition of various materials with low roughness and good uniformity across 4” (100 mm) diameter substrates, including at high temperatures. 1 chamber would be used primarily for deposition of metals, while the other would be designed for deposition of oxides and nitrides, including reactive processes involving the introduction of oxygen and/or nitrogen into the chamber. Additional deposition chambers such as for pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) are considered, as well. These are to be fully integrated into the vacuum transfer system above. As such, a suitable Nd: YAG laser is potentially required for PLD. Finally, in an attempt to improve the in situ characterisation capabilities, a dedicated, wafer compatible X-ray photo-electron spectroscopy (XPS) analytics chamber is also considered.